Goh Matsuura

Title: Goh Matsuura: Innovator in Semiconductor Etching Processes

Introduction

Goh Matsuura, an accomplished inventor based in Hartsdale, NY, has made significant contributions to the field of semiconductor technology. With three patents to his name, Matsuura's innovations focus on enhancing etch processes, which are critical in semiconductor fabrication.

Latest Patents

Matsuura's latest patents include techniques for improving the efficiency and effectiveness of silicon etch processes. One of his notable patents, titled "Etch rate enhancement for a silicon etch process through etch chamber pretreatment," describes a method of pretreating etch chambers that can increase the etch rate of silicon by at least 50%. This improvement occurs without adversely affecting the etch profile, allowing for higher throughput in production environments. Additionally, Matsuura's work on the "High aspect ratio and reduced undercut trench etch process for a semiconductor substrate" employs hydrofluorocarbon gas to create a protective polymer on trench sidewalls, minimizing undercuts below hard masks and improving overall etch rates.

Career Highlights

Matsuura has worked with prestigious organizations such as IBM and Zeon Corporation, where he honed his expertise in semiconductor manufacturing processes. His work has played a pivotal role in advancing technologies that are integral to the production of modern electronic devices.

Collaborations

Throughout his career, Matsuura has collaborated with notable professionals, including Eric Andrew Joseph and Edmund M Sikorski. These collaborations have yielded significant advancements in the field, further solidifying his reputation as an innovator.

Conclusion

Goh Matsuura's contributions to semiconductor etching processes demonstrate the importance of innovation in technology. His patents not only enhance the efficiency of manufacturing but also push the boundaries of what is possible in semiconductor fabrication. As technology continues to evolve, the impact of Matsuura's work will be felt for years to come.