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For the Inventor, By the Inventor

Mesa, AZ, United States of America

Glyn J Reynolds

This inventor holds 10 USPTO granted patents and 2 EPO patents. Top assignee: Tokyo Electron Limited. Active years: 2000-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Glyn J Reynolds. Retrieved from https://idiyas.com/inventor/glyn-j-reynolds

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 70.0

 

Average Co-Inventor Count = 3.4

ph-index = 8

Forward Citations = 666(Granted Patents)


Location History:

  • Mesa, AZ (US) (2001)
  • Gilbert, AZ (US) (2000 - 2004)
  • Las Vegas, NV (US) (2004 - 2006)

Company Filing History:

goldMedal10 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2000-2006

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10 patents (USPTO):Explore Patents
1. 7001491 - Vacuum-processing chamber-shield and multi-chamber pumping method (2006-02-21),
2. 6929720 - Sputtering source for ionized physical vapor deposition of metals (2005-08-16),
3. 6755945 - Ionized PVD with sequential deposition and etching (2004-06-29),
4. 6719886 - Method and apparatus for ionized physical vapor deposition (2004-04-13),
5. 6692219 - Reduced edge contact wafer handling system and method of retrofitting and using same (2004-02-17),
6. 6652711 - Inductively-coupled plasma processing system (2003-11-25),
7. 6417626 - Immersed inductively—coupled plasma source (2002-07-09),
8. 6287435 - Method and apparatus for ionized physical vapor deposition (2001-09-11),
9. 6183564 - Buffer chamber for integrating physical and chemical vapor deposition chambers together in a processing system (2001-02-06),
10. 6156164 - Virtual shutter method and apparatus for preventing damage to gallium (2000-12-05),

Title: Glyn J Reynolds: Innovator in Vacuum Processing Technology

Introduction

Glyn J Reynolds is a prominent inventor based in Mesa, AZ (US), known for his significant contributions to vacuum processing technology. With a total of 10 patents to his name, Reynolds has made a notable impact in the field of semiconductor manufacturing and plasma processing systems.

Latest Patents

Reynolds' latest patents include innovative technologies such as the "Vacuum-processing chamber-shield and multi-chamber pumping method." This invention provides a high gas flow conductance path to an exhaust volume maintained at high vacuum, allowing for the operation of multiple chambers at different pressures without cross-contamination. Another significant patent is the "Sputtering source for ionized physical vapor deposition of metals," which features a cylindrical target with a magnet array that forms a hollow cathode magnetron. This design enhances the efficiency of plasma processing systems.

Career Highlights

Glyn J Reynolds has built a successful career at Tokyo Electron Limited, where he has been instrumental in advancing vacuum processing technologies. His work has contributed to the development of more efficient and effective manufacturing processes in the semiconductor industry.

Collaborations

Throughout his career, Reynolds has collaborated with notable colleagues, including Michael James Grapperhaus and John Stephen Drewery. These partnerships have fostered innovation and the sharing of ideas within the field.

Conclusion

Glyn J Reynolds stands out as a key figure in the realm of vacuum processing technology, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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