Mesa, AZ, United States of America

Glyn J Reynolds


 

Average Co-Inventor Count = 3.4

ph-index = 8

Forward Citations = 656(Granted Patents)


Location History:

  • Mesa, AZ (US) (2001)
  • Gilbert, AZ (US) (2000 - 2004)
  • Las Vegas, NV (US) (2004 - 2006)

Company Filing History:


Years Active: 2000-2006

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10 patents (USPTO):Explore Patents

Title: Glyn J Reynolds: Innovator in Vacuum Processing Technology

Introduction

Glyn J Reynolds is a prominent inventor based in Mesa, AZ (US), known for his significant contributions to vacuum processing technology. With a total of 10 patents to his name, Reynolds has made a notable impact in the field of semiconductor manufacturing and plasma processing systems.

Latest Patents

Reynolds' latest patents include innovative technologies such as the "Vacuum-processing chamber-shield and multi-chamber pumping method." This invention provides a high gas flow conductance path to an exhaust volume maintained at high vacuum, allowing for the operation of multiple chambers at different pressures without cross-contamination. Another significant patent is the "Sputtering source for ionized physical vapor deposition of metals," which features a cylindrical target with a magnet array that forms a hollow cathode magnetron. This design enhances the efficiency of plasma processing systems.

Career Highlights

Glyn J Reynolds has built a successful career at Tokyo Electron Limited, where he has been instrumental in advancing vacuum processing technologies. His work has contributed to the development of more efficient and effective manufacturing processes in the semiconductor industry.

Collaborations

Throughout his career, Reynolds has collaborated with notable colleagues, including Michael James Grapperhaus and John Stephen Drewery. These partnerships have fostered innovation and the sharing of ideas within the field.

Conclusion

Glyn J Reynolds stands out as a key figure in the realm of vacuum processing technology, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to shape the future of semiconductor manufacturing.

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