The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Jun. 09, 2003
Glyn Jeremy Reynolds, Las Vegas, NV (US);
Glyn Jeremy Reynolds, Las Vegas, NV (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing system is provided with a cylindrical target, open at both ends, and with a magnet array that forms a hollow cathode magnetron (HCM). At one of the open ends is placed an inductively coupled RF energy source. A dielectric window at one end of the cylindrical target forms a seal between atmosphere and the processing system. A deposition baffle shield permits the coupling of RF energy from the coil into the chamber. The open end of the cylindrical target opposite the RF source faces the processing space. Magnetron magnets produce a magnetic trapping field having a null which acts as a mirror and separates a plasma-source from the processing space.