Batavia, IL, United States of America

Glenn Whitener

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2014-2019

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12 patents (USPTO):

Title: Glenn Whitener: Innovator in Chemical-Mechanical Polishing

Introduction

Glenn Whitener is a prominent inventor based in Batavia, IL, known for his significant contributions to the field of chemical-mechanical polishing. With a remarkable portfolio of 12 patents, he has made substantial advancements that enhance the efficiency and effectiveness of polishing materials used in various semiconductor applications.

Latest Patents

Whitener’s latest patents reflect his expertise in developing innovative polishing methods. One of his key inventions is a “Method of Polishing Group III-V Materials,” which outlines a comprehensive process for chemically-mechanically polishing substrates containing Group III-V materials. This method involves the use of a polishing pad and a specific chemical composition that includes abrasive particles and an oxidizing agent for optimal substrate preparation.

Another significant patent is the “Composition and Method for Polishing Silicon Carbide.” This invention details a chemical-mechanical polishing composition comprising silica particles, a polymer with sulfonic acid, and water, aimed at polishing silicon carbide and silicon nitride substrates. Both patents demonstrate Whitener’s commitment to advancing semiconductor fabrication techniques.

Career Highlights

Whitener is currently employed at Cabot Microelectronics Corporation, a leading provider of chemical mechanical planarization (CMP) solutions. His role at the company involves developing innovative polishing technologies that cater to the needs of the semiconductor industry. Through his work, he has played an essential role in improving the performance and reliability of electronic devices.

Collaborations

Throughout his career, Glenn has collaborated with esteemed colleagues, including Steven Grumbine and William J. Ward. Together, they have contributed to various research projects and developments that have furthered the field of chemical-mechanical polishing, showcasing the power of teamwork in achieving technological breakthroughs.

Conclusion

Glenn Whitener stands out as a vital contributor to the advancement of polishing technologies within the semiconductor space. His innovative patents not only highlight his expertise but also underscore the importance of continued research and development in improving manufacturing processes. With his dedication to innovation, he remains a key figure in the ever-evolving landscape of electronics and materials science.

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