Glenn S Warner

Title: Glenn S Warner: Innovator in Anti-Corrosion Treatments

Introduction

Glenn S Warner is a notable inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor technology, particularly in the area of anti-corrosion treatments for integrated circuits. His innovative approach has paved the way for advancements in the manufacturing processes of semiconductor devices.

Latest Patents

Warner holds a patent for an "Anti-corrosion treatment for patterning of metallic layers." This patent describes an improved method for defining interconnect patterns in integrated circuits fabricated on semiconductor wafers. The method involves immersing the wafer in a weak base solution before etching a titanium-tungsten barrier layer. This step effectively removes chlorides and fluorides that remain from previous etching processes. Additionally, a preferred embodiment includes immersing the wafer in a strong acid solution to further eliminate chlorides.

Career Highlights

Glenn S Warner is associated with Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work has contributed to the development of more reliable and efficient integrated circuits, enhancing the performance of electronic devices.

Collaborations

Warner has collaborated with notable colleagues, including Kenneth J Mockler and Richard C Kittler. These partnerships have fostered innovation and have been instrumental in advancing their shared goals in semiconductor technology.

Conclusion

Glenn S Warner's contributions to anti-corrosion treatments in semiconductor manufacturing highlight his role as an influential inventor. His patented methods continue to impact the industry positively, ensuring the reliability of integrated circuits.