The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 1987

Filed:

Aug. 30, 1985
Applicant:
Inventors:

Kenneth J Mockler, Cupertino, CA (US);

Richard C Kittler, Santa Clara, CA (US);

Glenn S Warner, San Jose, CA (US);

Howard F Hsu, San Jose, CA (US);

Assignee:

Advanced Micro Devices, Inc., Sunnyvale, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C / ;
U.S. Cl.
CPC ...
156643 ; 156652 ; 156656 ; 1566571 ; 156664 ; 156665 ; 430313 ; 430316 ; 430318 ;
Abstract

An improved method is provided for defining interconnect patterns in an integrated circuit fabricated on a semiconductor wafer. The improvement comprises the step of immersing the wafer in a weak base solution, prior to etching a titanium-tungsten barrier layer, so as to remove from the wafer chlorides and flourides remaining as a result of a previous step of etching a conductor layer. In a preferred embodiment of the invention, a step of immersing the wafer in a strong acid solution is also performed to remove chlorides from the wafer.


Find Patent Forward Citations

Mockler, Kenneth. (1987). Anti-corrosion treatment for patterning of metallic layers (U.S. Patent No. 4668335). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4668335

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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