Hopewell Junction, NY, United States of America

Glenn L Cellier


Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2000-2014

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2 patents (USPTO):Explore Patents

Title: Innovations by Glenn L. Cellier

Introduction

Glenn L. Cellier is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of chemical mechanical polishing and ceramic processing, holding a total of 2 patents. His work is characterized by innovative approaches to improving manufacturing processes.

Latest Patents

One of Glenn's latest patents is titled "Applying different pressures through sub-pad to fixed abrasive CMP pad." This invention involves a chemical mechanical polishing (CMP) system that features a rotating polishing table with a platen providing at least two pressure zones. These zones have different pressures, allowing for enhanced topography on the fixed abrasive pad. The system includes a sub-pad with openings for pressure transmission and a pressure-creating system that is sealingly coupled to the platen.

Another significant patent is the "Detailing and cleaning apparatus for green ceramic dry dicing process." This apparatus is designed for processing a ceramic laminate with an array of unfired ceramic substrates. It includes a frame and a vacuum chuck fixture for securing the laminate, along with independently movable blade assemblies that pass through slots in the laminate to loosen debris. A flexible cleaner follows to remove the loosened debris, ensuring a thorough cleaning process.

Career Highlights

Glenn L. Cellier is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop new technologies. His work at IBM has allowed him to contribute to advancements in various manufacturing processes, particularly in the fields of chemical mechanical polishing and ceramic processing.

Collaborations

Throughout his career, Glenn has collaborated with notable colleagues, including Laertis Economikos and Timothy M. McCormack. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Glenn L. Cellier's contributions to innovation in chemical mechanical polishing and ceramic processing highlight his expertise and dedication to advancing technology. His patents reflect a commitment to improving manufacturing processes, making him a significant figure in his field.

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