Livermore, CA, United States of America

Glen E Howard



Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1993-2004

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2 patents (USPTO):Explore Patents

Title: Glen E Howard: Innovator in Electron Beam Technology

Introduction

Glen E Howard is a notable inventor based in Livermore, CA (US), recognized for his contributions to electron beam technology. With a total of 2 patents, Howard has made significant advancements in the field, particularly in semiconductor lithography equipment.

Latest Patents

Howard's latest patents include "Electron beam patterning with a heated electron source" and "Arc suppressor for electron gun." The first patent describes an electron source that features an anode and a cathode capable of being negatively biased relative to the anode. This cathode has an electron emitting portion and a cathode axis, with an electromagnetic radiation source designed to generate a beam that heats the cathode. A lens directs this beam onto the cathode, forming an acute angle with the cathode axis. The second patent, "Arc suppressor for electron gun," provides a solution for preventing damaging emission properties of the electron gun used in semiconductor lithography. This arc suppressor includes a resistance and an inductor in series with each electrode lead, effectively isolating each lead magnetically to reduce transformer and capacitive effects.

Career Highlights

Throughout his career, Glen E Howard has worked with prominent companies such as Etec Systems, Inc. and Applied Materials, Inc. His experience in these organizations has contributed to his expertise in electron beam technology and semiconductor applications.

Collaborations

Howard has collaborated with notable individuals in the field, including Mark A Gesley and William J DeVore. These collaborations have likely enriched his work and led to innovative solutions in electron beam technology.

Conclusion

Glen E Howard's contributions to electron beam technology and his innovative patents highlight his role as a significant inventor in the field. His work continues to influence advancements in semiconductor lithography and related technologies.

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