Leeds, United Kingdom

Gin Jose

This inventor holds 3 USPTO granted patents and 5 published patent applications and 3 EPO patents. Top assignee: University of Leeds. Active years: 2018-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gin Jose. Retrieved from https://idiyas.com/inventor/gin-jose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 66.7

 

Average Co-Inventor Count = 4.5

ph-index = 1


Company Filing History:


Years Active: 2018-2021

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3 patents (USPTO):Explore Patents

Title: Innovations of Inventor Gin Jose

Introduction

Gin Jose is a notable inventor based in Leeds, GB. He has made significant contributions to the field of materials science, particularly in the area of ion implantation. With a total of 3 patents to his name, his work has implications for various technological applications.

Latest Patents

One of Gin Jose's latest patents involves a substrate comprising an ion-implanted layer. This invention allows for a substantially uniform distribution of implanted ions at a significantly greater depth than previously possible. The substrate is silicon-based, such as glass, and can be utilized as a waveguide and in measurement devices. Another patent focuses on the process for ion implantation, which shares similar characteristics and applications as his previous work.

Career Highlights

Gin Jose is affiliated with the University of Leeds, where he continues to advance his research and innovations. His work has garnered attention for its potential applications in various industries, including telecommunications and measurement technologies.

Collaborations

Gin collaborates with talented individuals such as Animesh Jha and Sikha Saha, who contribute to his research endeavors.

Conclusion

Gin Jose's innovative work in ion implantation and materials science showcases his commitment to advancing technology. His contributions are paving the way for new applications and improvements in various fields.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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