The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2021

Filed:

Feb. 08, 2019
Applicant:

University of Leeds, Leeds, GB;

Inventors:

Gin Jose, Leeds, GB;

Toney Teddy Fernandez, Kerala, IN;

Peter John Grant, Leeds, GB;

Animesh Jha, Leeds, GB;

Sikha Saha, Leeds, GB;

David Paul Steenson, Bradford, GB;

Assignee:

UNIVERSITY OF LEEDS, Yorkshire, GB;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C03C 23/00 (2006.01); C03C 3/04 (2006.01); A61B 1/00 (2006.01); C23C 14/48 (2006.01); A61B 5/1455 (2006.01); C23C 14/28 (2006.01); C23C 14/32 (2006.01); C23C 14/22 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
C03C 23/0055 (2013.01); A61B 5/1455 (2013.01); C03C 3/04 (2013.01); C23C 14/221 (2013.01); C23C 14/28 (2013.01); C23C 14/32 (2013.01); C23C 14/48 (2013.01); G02B 2006/12061 (2013.01); G02B 2006/12188 (2013.01); Y10T 428/31 (2015.01); Y10T 428/315 (2015.01);
Abstract

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.


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