This inventor holds 3 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignee: University of Leeds. Active years: 2018-2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018-2021
Title: Sikha Saha: Innovator in Ion Implantation Technology
Introduction
Sikha Saha is a prominent inventor based in Leeds, GB. She has made significant contributions to the field of materials science, particularly in the area of ion implantation technology. With a total of 3 patents to her name, Sikha is recognized for her innovative approaches to substrate materials.
Latest Patents
Sikha's latest patents focus on a substrate comprising an ion-implanted layer. This invention allows for a substantially uniform distribution of implanted ions at a significantly greater depth than previously possible. The well-defined and sharp boundary within the substrate enhances its functionality. The substrate is primarily silicon-based, such as glass, and is designed for use as a waveguide and in measurement devices.
Career Highlights
Sikha Saha is affiliated with the University of Leeds, where she conducts her research and development. Her work has garnered attention for its practical applications in various technological fields.
Collaborations
Sikha collaborates with notable colleagues, including Gin Jose and Animesh Jha, to further her research initiatives and explore new innovations in her field.
Conclusion
Sikha Saha's contributions to ion implantation technology exemplify her commitment to advancing materials science. Her innovative patents and collaborative efforts position her as a key figure in her area of expertise.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile