Company Filing History:
Years Active: 2021-2024
Title: Gil Loewenthal: Innovator in Etch Control Technology
Introduction
Gil Loewenthal is a prominent inventor based in Tel Aviv, Israel. He has made significant contributions to the field of etch control technology, holding a total of 2 patents. His work focuses on enhancing the precision of etching processes in multi-layered structures, which is crucial for various applications in semiconductor manufacturing.
Latest Patents
Loewenthal's latest patents revolve around a method for layer detection during high aspect ratio etch control. This innovative approach involves calculating a spectral derivative of reflectance from an illuminated region of interest during the etching process. By identifying discontinuities in the spectral derivative, Loewenthal's method can determine when an edge of a void formed by the etch process crosses a layer boundary. This allows for the application of predefined control actions to optimize the etch process, ensuring that it aligns with the preselected layer boundaries of the multi-layered structure.
Career Highlights
Gil Loewenthal is currently employed at Nova Corporation, where he continues to develop cutting-edge technologies in etch control. His expertise and innovative mindset have positioned him as a key player in the industry, contributing to advancements that enhance manufacturing efficiency and product quality.
Collaborations
Loewenthal collaborates with talented professionals such as Shay Yogev and Yoav Etzioni. Their combined efforts foster a creative environment that drives innovation and leads to the development of groundbreaking technologies.
Conclusion
Gil Loewenthal's contributions to etch control technology exemplify the impact of innovative thinking in the semiconductor industry. His patents and collaborative efforts continue to shape the future of manufacturing processes.