Company Filing History:
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Years Active: 2010-2025
Title: Gian Francesco Lorusso: Innovator in Lithography Technology
Introduction
Gian Francesco Lorusso is a notable inventor based in Overijse, Belgium. He has made significant contributions to the field of lithography, particularly in the development of advanced metrology techniques. With a total of 5 patents to his name, Lorusso's work has had a profound impact on the semiconductor industry.
Latest Patents
Lorusso's latest patents include innovative technologies that enhance the precision of lithographic processes. One of his key inventions is a method for pattern height metrology using an electron beam system. This technology allows for the determination of pattern height produced with extreme ultraviolet (EUV) lithography in a resist film. The method utilizes a scanning electron microscope (SEM) to obtain images of the pattern, from which a processor determines the pattern height based on contrast values and calibration data.
Another significant patent focuses on methods and systems for evaluating extreme ultraviolet mask flatness. This invention involves directing electromagnetic radiation towards a lithographic optical element and evaluating the topography of the element based on the interaction of the radiation with a photosensitive layer. These advancements are crucial for improving the accuracy and efficiency of lithographic processes.
Career Highlights
Throughout his career, Gian Francesco Lorusso has worked with leading companies in the technology sector. Notably, he has been associated with Imec and Samsung Electronics Co., Ltd. His experience in these organizations has allowed him to collaborate on cutting-edge research and development projects.
Collaborations
Lorusso has worked alongside talented professionals in the field, including Rik Jonckheere and Anne-Marie Goethals. These collaborations have contributed to the success of his innovative projects and patents.
Conclusion
Gian Francesco Lorusso is a distinguished inventor whose work in lithography technology continues to influence the industry. His patents reflect a commitment to advancing metrology techniques and improving the precision of lithographic processes.