The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Feb. 21, 2008
Gian Francesco Lorusso, Overijse, BE;
IN Sung Kim, Suwon-si, KR;
Byeong Soo Kim, Hwasung-si, KR;
Anne-marie Goethals, Oud-Heverlee, BE;
Rik Jonckheere, Muizen, BE;
Jan Hermans, Lummen, BE;
Gian Francesco Lorusso, Overijse, BE;
In Sung Kim, Suwon-si, KR;
Byeong Soo Kim, Hwasung-si, KR;
Anne-Marie Goethals, Oud-Heverlee, BE;
Rik Jonckheere, Muizen, BE;
Jan Hermans, Lummen, BE;
IMEC, Leuven, BE;
Samsung Electronics Co., Ltd., Suwon-Si, Gyenoggi-Do, KR;
Abstract
A method of designing a lithographic mask for use in lithographic processing of a substrate is disclosed. The lithographic processing comprises irradiating mask features of a lithographic mask using a predetermined irradiation configuration. In one aspect, the method comprises obtaining an initial design for the lithographic mask comprising a plurality of initial design features having an initial position. The method further comprises applying at least one shift to at least one initial design feature and deriving there from an altered design so as to compensate for shadowing effects when irradiating the substrate using a lithographic mask corresponding to the altered design in the predetermined irradiation configuration. Also disclosed herein are a corresponding design, a method of setting up lithographic processing, a system for designing a lithographic mask, a lithographic mask, and a method of manufacturing it.