Incheon, South Korea

Gi Joo Shin

This inventor holds 1 USPTO granted patent. Top assignee: K. C. Tech Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gi Joo Shin. Retrieved from https://idiyas.com/inventor/gi-joo-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Gi Joo Shin: Innovator in Polishing Slurry Composition

Introduction

Gi Joo Shin is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of polishing slurry compositions, which are essential in various manufacturing processes. His innovative approach has led to the development of a unique formulation that enhances multi-selectivity in polishing applications.

Latest Patents

Gi Joo Shin holds a patent for a "Polishing slurry composition enabling implementation of multi-selectivity." This invention includes a polishing liquid that contains abrasive particles and an additive liquid. The additive liquid is composed of a polymer with an amide bond and a cationic polymer. This innovative composition allows for improved performance in polishing processes.

Career Highlights

Gi Joo Shin is currently employed at K. C. Tech Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of polishing technologies.

Collaborations

Gi Joo Shin collaborates with talented individuals such as Jung Yoon Kim and Kwang Soo Park. Their combined expertise contributes to the innovative projects at K. C. Tech Co., Ltd.

Conclusion

Gi Joo Shin's contributions to the field of polishing slurry compositions demonstrate his commitment to innovation and excellence. His work not only advances technology but also sets a standard for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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