Pohang, South Korea

Ghorai Arup

This inventor holds 1 USPTO granted patent. Top assignee: Pohang University of Science and Technology Foundation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ghorai Arup. Retrieved from https://idiyas.com/inventor/ghorai-arup

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Ghorai Arup: Innovator in Chalcogenide Thin Film Technology

Introduction

Ghorai Arup is a notable inventor based in Pohang-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of chalcogenide thin films. His innovative approach has led to advancements that could impact various technological applications.

Latest Patents

Ghorai Arup holds a patent for a "Method for forming chalcogenide thin film." This method involves forming a chalcogen element-containing film on a carrier substrate and then disposing of this film on a silicon wafer. The process includes ensuring that the surfaces of the silicon wafer and the chalcogen element-containing film are in contact, followed by heat treatment and the removal of the carrier substrate. Notably, the silicon wafer utilized in this method has a crystal plane of (111).

Career Highlights

Arup is associated with the Postech Research and Business Development Foundation, where he continues to explore innovative solutions in material science. His work has garnered attention for its potential applications in various industries.

Collaborations

Ghorai Arup collaborates with talented individuals such as Unyong Jeong and Giri Anupam, contributing to a dynamic research environment that fosters innovation.

Conclusion

Ghorai Arup's contributions to the field of chalcogenide thin films exemplify the spirit of innovation. His work not only advances scientific knowledge but also paves the way for future technological developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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