This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: Gey-Fung Wei: Innovator in Semiconductor Technology
Introduction
Gey-Fung Wei is a notable inventor based in Mai-Lie, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist development.
Latest Patents
Gey-Fung Wei holds a patent titled "Method for cleaning a photoresist developer spray stream nozzle." This invention provides a method and apparatus for cleaning a spray stream nozzle used in dispensing a photoresist developer solution onto a photoexposed blanket photoresist layer over a semiconductor substrate. The process involves using a spray stream nozzle with at least one aperture, delivering a sufficient volume of photoresist developer solution, and subsequently using a solvent that does not clog the nozzle. He has 1 patent to his name.
Career Highlights
Gey-Fung Wei is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has contributed to advancements in manufacturing processes and efficiency.
Collaborations
He has collaborated with notable colleagues, including Tsun-Ching Lin and Hsiao-Lan Yeh, enhancing the innovation landscape within his field.
Conclusion
Gey-Fung Wei's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the development of efficient manufacturing processes in semiconductor production.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile