This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Geuntak Lee: Plasma Processing Patent Inventor
Introduction
Geuntak Lee is an inventor based in Santa Clara, California, and is associated with Applied Materials, Inc. His work includes a patented approach to controlling plasma through pulsed voltage waveforms. The supplied information lists 1 patent for Lee.
Latest Patents
Lee’s listed patent is titled “Pulsed Voltage Waveform with Binary Pulses for Biasing of Plasma,” concerning methods and apparatus for forming a plasma with a discrete multimodal ion energy distribution function (IEDF).
The described method generates two bursts of voltage pulses in different pulsing states. Each burst contains multiple pulses, and the first, second, third, and fourth voltages are different. This approach is designed to shape the ion energy distribution in plasma processing.
Career Highlights
Lee is associated with Applied Materials, Inc., a company whose work includes equipment and technologies for semiconductor manufacturing. His listed patent reflects an inventive contribution to plasma biasing and ion energy control.
Collaborations
The supplied information identifies Shreeram Jyoti Dash and Takumi Yanagawa as Lee’s coworkers. Their names are provided as professional associations, though specific joint roles or contributions are not detailed.
Conclusion
Geuntak Lee’s listed patent focuses on using distinct pulsed voltage levels to form a controlled multimodal ion energy distribution in plasma, highlighting his contribution to semiconductor processing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile