Gertrud Valouch

Title: Gertrud Valouch: Innovator in Semiconductor Surface Treatment

Introduction

Gertrud Valouch is a notable inventor based in Burghausen, Germany. She has made significant contributions to the field of semiconductor technology, particularly in the treatment of semiconductor surfaces. Her innovative approach has led to advancements that enhance the efficiency and effectiveness of semiconductor processing.

Latest Patents

Gertrud Valouch holds a patent for a "Process for the wet-chemical treatment of semiconductor surfaces." This patent addresses the contamination of semiconductor slices, especially silicon slices, during treatment with aqueous solutions containing hydrofluoric acid. The invention highlights that the increase in surface particles, which can interfere with subsequent processes, can be significantly reduced by adding organic ring molecules capable of forming inclusion compounds, such as cyclodextrins, and/or acids with a pKa below 3.14 that do not oxidize the semiconductor material. The treatment can be performed using conventional methods, such as immersion baths. She has 1 patent to her name.

Career Highlights

Gertrud Valouch has built her career at Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, where she has been instrumental in developing innovative solutions for semiconductor processing. Her work has not only contributed to her company's success but has also advanced the field of electronics.

Collaborations

Throughout her career, Gertrud has collaborated with esteemed colleagues, including Anton Schnegg and Laszlo Fabby. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Gertrud Valouch's contributions to semiconductor surface treatment exemplify her dedication to innovation in technology. Her patent and work at Wacker-Chemitronic highlight her role as a leading figure in the field.