The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 1991

Filed:

Dec. 12, 1990
Applicant:
Inventors:

Anton Schnegg, Burghausen, DE;

Laszlo Fabby, Emmerting, DE;

Peter Nusstein, Munich, DE;

Gertrud Valouch, Burghausen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23G / ;
U.S. Cl.
CPC ...
134-3 ; 134 41 ; 252142 ; 252143 ; 156640 ; 156662 ;
Abstract

In the treatment of semiconductor slices, in particular silicon slices, w aqueous solutions containing hydrofluoric acid, a contamination of the slice surface with particles which interfere with the subsequent processes has been observed. This increase in particles can be markedly decreased by additionally adding to the solutions, organic ring molecules capable of forming inclusion compounds, such as, for instance, cyclodextrins, and/or acids with pKa below 3.14 which are incapable of oxidizing the semiconductor material. The actual treatment can be carried out in the usual way, for example, in immersion baths.


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