Company Filing History:
Years Active: 2016
Title: Gerd Pohlers: Innovator in Photoresist Technology
Introduction
Gerd Pohlers is a notable inventor based in Needham, MA (US). He has made significant contributions to the field of photoresist technology, particularly in applications related to ion implant lithography.
Latest Patents
Gerd Pohlers holds a patent for "Photoresists and methods for use thereof." This innovative patent introduces new photoresists that comprise a multi-keto component, which are particularly useful for ion implant lithography applications. The preferred photoresists of this invention exhibit good adhesion to various underlying inorganic surfaces, including SiON, silicon oxide, silicon nitride, hafnium silicate, and zirconium silicate.
Career Highlights
Gerd Pohlers is associated with Rohm & Haas Electronic Materials LLC, where he has been instrumental in advancing electronic materials technology. His work has contributed to the development of high-performance materials that are essential in modern electronics.
Collaborations
Gerd has collaborated with Stefan J Caporale, further enhancing the innovative capabilities within his field.
Conclusion
Gerd Pohlers is a distinguished inventor whose work in photoresist technology has paved the way for advancements in ion implant lithography applications. His contributions continue to impact the electronic materials industry significantly.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.