The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Dec. 30, 2011
Applicants:
Gerd Pohlers, Needham, MA (US);
Stefan J. Caporale, Marlborough, MA (US);
Inventors:
Gerd Pohlers, Needham, MA (US);
Stefan J. Caporale, Marlborough, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); G03F 7/00 (2006.01); H01L 21/266 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
H01L 21/266 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/09 (2013.01); G03F 7/40 (2013.01);
Abstract
New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride, hafnium silicate, zirconium silicate and other inorganic surfaces.