Company Filing History:
Years Active: 2001-2007
Title: Innovations of Gerard S Maloney
Introduction
Gerard S Maloney is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of chemical-mechanical polishing, holding a total of 5 patents. His work has been instrumental in advancing technologies used in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure." This invention features a resilient pneumatic annular sealing bladder that is coupled for fluid communication to a first pressurized pneumatic fluid. It defines a first pneumatic zone and is attached to a first surface of the wafer stop plate adjacent to the retaining ring interior cylindrical surface. This design supports the wafer at its peripheral edge during polishing operations.
Another significant patent is the "Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring." This invention provides a structure and method for achieving a uniformly polished substrate, such as a semiconductor wafer. It includes a housing, a carrier for mounting the substrate, and a retaining ring that circumscribes the carrier. The design allows for substantially uniform polishing between the center and the edge of the wafer, enhancing the overall efficiency of the polishing process.
Career Highlights
Throughout his career, Gerard has worked with prominent companies such as Ebara Corporation and Mitsubishi Materials Corporation. His experience in these organizations has contributed to his expertise in the field of semiconductor manufacturing and polishing technologies.
Collaborations
Gerard has collaborated with notable coworkers, including Scott Chin and Jason Price. Their combined efforts have led to advancements in the technologies they have developed together.
Conclusion
Gerard S Maloney's innovations in chemical-mechanical polishing have significantly impacted the semiconductor industry. His patents reflect a deep understanding of the complexities involved in polishing technologies, making him a valuable contributor to the field.