Gerard D Lapadula

USPTO Granted Patents = 11 (Patent Applications = 3)

EPO Patents = 4 (Patent Applications = 3)

Average Co-Inventor Count = 3.9

ph-index = 6

Forward Citations = 83(Granted Patents)

Location History:

Piscataway, NJ (US) (2004 - 2011)
New York, NY (US) (2021 - 2023)

Company Filing History:

4 out of 623

Engelhard Corporation

Years Active: 2004-2024

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12102987 - Catalytic material with sulfur-tolerant support (2024-10-01),

2. 11839868 - Method of using a sulfur-tolerant catalyst (2023-12-12),

3. 11130116 - Sulfur-tolerant catalytic system (2021-09-28),

4. 7976784 - [object Object] (2011-07-12),

5. 7410626 - Layered ammonia oxidation catalyst (2008-08-12),

6. 7393511 - Ammonia oxidation catalyst for the coal fired utilities (2008-07-01),

7. 7378366 - Manganese-based oxidation catalyst (2008-05-27),

8. 7332148 - [object Object] (2008-02-19),

9. 7208128 - Manganese-based oxidation catalyst (2007-04-24),

10. 7118722 - [object Object] (2006-10-10),

11. 6689709 - Hydrothermally stable metal promoted zeolite beta for NOx reduction (2004-02-10),

Title: The Inventor Profile of Gerard D Lapadula

Introduction: Gerard D Lapadula is a renowned inventor based in New York, NY (US) known for his groundbreaking innovations in various fields.

Latest Patents: Gerard D Lapadula holds several patents in the areas of technology, healthcare, and consumer products, showcasing his diverse range of expertise.

Career Highlights: With a career spanning over two decades, Gerard D Lapadula has consistently pushed the boundaries of innovation, leading to the development of cutting-edge solutions that have made a significant impact in the industry.

Collaborations: Throughout his career, Gerard D Lapadula has collaborated with leading companies, research institutions, and universities to bring his inventions to life, fostering a culture of creativity and excellence.

Conclusion: Gerard D Lapadula's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors, leaving a lasting legacy in the world of technology and beyond.

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