Company Filing History:
Years Active: 2019
Title: Geraldine Jamieson: Innovator in Semiconductor Technology
Introduction
Geraldine Jamieson is a notable inventor based in Balen, Belgium. She has made significant contributions to the field of semiconductor technology, particularly through her innovative methods for producing contact areas on semiconductor substrates. Her work has implications for the efficiency and effectiveness of semiconductor devices.
Latest Patents
Geraldine holds a patent for a "Method for producing contact areas on a semiconductor substrate." This patent describes a method for creating hollow contact areas for insertion bonding on a semiconductor substrate that consists of a stack of metallization layers. The process involves etching openings in a dielectric layer using plasma etching, with a resist layer serving as a mask. The parameters of the resist layer and plasma etching are carefully selected to achieve openings with sloped sidewalls, which are essential for the controlled formation of a polymer layer. The method also includes the deposition of metal in the hollow contact areas, followed by chemical mechanical polishing to ensure mutually isolated contact areas. This innovation is crucial for the development of advanced semiconductor packages.
Career Highlights
Geraldine has established herself as a key figure in her field, working at Imec, a leading research and innovation hub in nanoelectronics and digital technologies. Her expertise and innovative approach have positioned her as a valuable asset in the semiconductor industry.
Collaborations
Throughout her career, Geraldine has collaborated with esteemed colleagues such as Eric Beyne and Wenqi Zhang. These partnerships have further enhanced her research and development efforts, contributing to the advancement of semiconductor technologies.
Conclusion
Geraldine Jamieson's contributions to semiconductor technology through her innovative patent demonstrate her significant role in the field. Her work not only advances the technology but also paves the way for future developments in semiconductor applications.