Company Filing History:
Years Active: 2018-2019
Title: Gerald Reinwald: Innovator in Silicon Carbide Semiconductor Technology
Introduction
Gerald Reinwald is a notable inventor based in Wernberg, Austria. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of silicon carbide devices. With a total of 2 patents to his name, Reinwald's work has advanced the capabilities of semiconductor manufacturing processes.
Latest Patents
Reinwald's latest patents focus on a method of manufacturing a silicon carbide semiconductor device by removing amorphized portions. The process involves forming a trench that extends from a main surface into a crystalline silicon carbide semiconductor layer. A mask is created that includes an opening exposing the trench and a rim section of the main surface around it. By using a particle beam for irradiation, a first portion of the semiconductor layer exposed by the mask opening and a second portion adjoining it are amorphized. The vertical extension of the amorphized second portion decreases with distance from the first portion, and both amorphized portions are subsequently removed.
Career Highlights
Gerald Reinwald is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to focus on innovative methods that enhance the efficiency and performance of semiconductor devices.
Collaborations
Throughout his career, Reinwald has collaborated with esteemed colleagues such as Thomas Aichinger and Wolfgang Bergner. These collaborations have contributed to the development of advanced technologies in the semiconductor industry.
Conclusion
Gerald Reinwald's contributions to silicon carbide semiconductor technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving manufacturing processes, which will have lasting impacts on the semiconductor industry.