Sint-Oedenrode, Netherlands

Gerald Dicker

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gerald Dicker. Retrieved from https://idiyas.com/inventor/gerald-dicker-6fak9gj4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Gerald Dicker: Innovator in Patterning Processes

Introduction

Gerald Dicker is a notable inventor based in Sint-Oedenrode, Netherlands. He has made significant contributions to the field of patterning processes, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of these processes using advanced technology.

Latest Patents

Gerald Dicker holds a patent for a "Method for adjusting a patterning process." This invention describes a system for generating a control output for a patterning process. The method involves receiving a control input that includes parameters used in the patterning process. A trained machine learning model generates the control output based on this control input. The model is trained using data from simulations and actual process data, which includes various operational conditions and their specific behaviors over time.

Career Highlights

Gerald Dicker is associated with ASML Netherlands B.V., a leading company in the semiconductor industry. His role at ASML allows him to apply his innovative ideas and contribute to the advancement of technology in patterning processes.

Collaborations

Due to space constraints, the details of collaborations will not be included.

Conclusion

Gerald Dicker's contributions to the field of patterning processes through his innovative patent demonstrate his expertise and commitment to advancing technology. His work at ASML Netherlands B.V. further highlights his role in shaping the future of the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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