This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Advanced Energy Industries, Inc.. Active years: 2006.
Company Filing History:
Years Active: 2006
Title: Gerald C Roop, Jr: Innovator in DC Power Supply Technology
Introduction
Gerald C Roop, Jr is a notable inventor based in Fort Collins, CO (US). He has made significant contributions to the field of electrical engineering, particularly in the area of power supply technology. His innovative approach has led to the development of a unique patent that addresses the challenges associated with plasma processing systems.
Latest Patents
Gerald holds a patent for a "DC power supply utilizing real time estimation of dynamic impedance." This invention provides an apparatus and method for controlling a DC magnetron plasma processing system. It automatically adjusts the control signal to the power supply based on the dynamic impedance of the load, thereby controlling the output power to the plasma. The system samples the output voltage and current at a frequency significantly higher than the switching frequency, allowing for accurate calculation of the dynamic impedance. If the dynamic impedance is negative, the control signal is adjusted accordingly to optimize performance.
Career Highlights
Gerald is associated with Advanced Energy Industries, Inc., where he applies his expertise in power supply technology. His work has been instrumental in advancing the capabilities of plasma processing systems, making them more efficient and reliable. His innovative solutions have garnered attention in the industry, showcasing his commitment to excellence in engineering.
Collaborations
Gerald has collaborated with talented professionals such as Milan Zarko Ilic and David J Christie. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Gerald C Roop, Jr is a distinguished inventor whose work in DC power supply technology has made a significant impact on the field. His innovative patent demonstrates his ability to solve complex engineering challenges, contributing to advancements in plasma processing systems. His career continues to inspire future innovations in electrical engineering.