The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Jul. 02, 2004
Milan Ilic, Fort Collins, CO (US);
Kalyan N. C. Siddabattula, Fort Collins, CO (US);
Gerald C. Roop, Jr., Fort Collins, CO (US);
David J. Christie, Fort Collins, CO (US);
Milan Ilic, Fort Collins, CO (US);
Kalyan N. C. Siddabattula, Fort Collins, CO (US);
Gerald C. Roop, Jr., Fort Collins, CO (US);
David J. Christie, Fort Collins, CO (US);
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Abstract
There is provided by this invention an apparatus and method for controlling a dc magnetron plasma processing system that automatically adjusts the control signal to the power supply based upon the dynamic impedance of the load to control the output power to the plasma. The output voltage and the output current of the power supply that supplies power to the plasma is sampled over at a sampling frequency at least four to five times higher than the switching frequency and the dynamic impedance of the plasma is calculated based upon the sampled voltage and current from the algorithm wherein ΔVand ΔIis the maximum difference among samples on one switching cycle. If the dynamic impedance seen is negative in nature then the control signal is compensated accordingly.