Georgia J Fisanick

Title: Georgia J Fisanick: Innovator in Photomask Technology

Introduction

Georgia J Fisanick is a notable inventor based in Warren, NJ (US). She has made significant contributions to the field of photomask technology, holding 2 patents that showcase her innovative approaches to solving complex problems in this area.

Latest Patents

Fisanick's latest patents include a "Method of forming metal regions" and a "Method of repairing a defective photomask." The first patent describes a process of radiation-induced formation of a uniform metal or metal oxide region suitable for device application or for repairing transparent defects in patterned metal films of lithographic masks. This process requires careful limitation of the heat evolved during the radiation-induced reactions to achieve the desired uniformity. The second patent outlines a process of laser-induced metal deposition for repairing transparent defects in patterned metal films of photomasks. This method involves several steps, including coating the substrate surface with a layer of metal-organic compound, exposing the layer to a laser beam, ramping the power level of the radiation beam until a reflective and adherent metal patch is formed, and removing the unexposed portions of the metal-organic compound.

Career Highlights

Throughout her career, Fisanick has worked with prominent companies such as AT&T Technologies, Inc. and Bell Telephone Laboratories. Her experience in these organizations has allowed her to develop and refine her innovative techniques in photomask technology.

Collaborations

Fisanick has collaborated with notable coworkers, including Michal Edith Gross and Gary L Wolk. These partnerships have contributed to her success and the advancement of her inventions.

Conclusion

Georgia J Fisanick is a pioneering inventor whose work in photomask technology has led to significant advancements in the field. Her patents reflect her commitment to innovation and problem-solving in complex technological areas.