The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 1987

Filed:

Apr. 29, 1985
Applicant:
Inventors:

Georgia J Fisanick, Warren Township, Somerset County, NJ (US);

Michal E Gross, Summit, NJ (US);

Gary L Wolk, Ewing Township, Mercer County, NJ (US);

Assignees:

AT&T Technologies, Inc., Berkeley Heights, NJ (US);

Bell Telephone Laboratories, Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B32B / ;
U.S. Cl.
CPC ...
427 531 ; 427140 ; 427142 ; 430-5 ; 430945 ;
Abstract

A process of laser-induced metal deposition for repairing transparent defects (18) in patterned metal films (14) of photomasks (10). The process comprises the steps of (a) coating the surface (16) of the substrate (12) having the film (14) thereon with a layer of metal-organic compound (50); (b) exposing the portions of the layer of metal-organic compound (50) overlying the defects (18) to a beam (24) of electromagnetic radiation from a laser (22); (c) ramping the power level of the radiation beam (24) delivered by the laser (22) until a metal patch (52) is reflective and adherent is formed; and (d) removing the unexposed portions of metal-organic compound (50) remaining on the substrate surface (16).


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Fisanick, Georgia. (1987). Method of repairing a defective photomask (U.S. Patent No. 4636403). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4636403

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