The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1993
Filed:
May. 28, 1992
Applicant:
Inventors:
Donald K Atwood, Warren, NJ (US);
Georgia J Fisanick, Warren, NJ (US);
Michal E Gross, Summit, NJ (US);
Abraham Katzir, Tel Aviv, IL;
Gary L Wolk, West Trenton, NJ (US);
Assignee:
AT&T Bell Laboratories, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430269 ; 430346 ; 430348 ; 430494 ; 430495 ; 430945 ; 430947 ; 430964 ; 427 10 ; 427555 ; 427596 ; 427557 ;
Abstract
A process of radiation-induced formation of a uniform metal or metal oxide region suitable for device application or for repairing transparent defects in pattern metal films of lithographic masks has been found. The process requires that the heat evolved during the radiation-induced reactions be carefully limited to produce the desired uniformity.