San Jose, CA, United States of America

George Guan


Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 134(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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6 patents (USPTO):Explore Patents

Title: Innovations by George Guan in Semiconductor Technology

Introduction

George Guan is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on developing formulations that enhance the efficiency of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, Guan has developed "Ammonium borate containing compositions for stripping residues from semiconductor substrates." This invention comprises formulations designed to strip wafer residues that originate from halogen-based plasma metal etching followed by oxygen plasma ashing. The formulations include an organic amine or a mixture of amines (15-60%), water (20-60%), ammonium tetraborate or ammonium pentaborate (9-20%), and an optional polar organic solvent (0-15%). Another notable patent is "Boric acid containing compositions for stripping residues from semiconductor substrates," which shares similar components and aims to improve the cleaning process in semiconductor fabrication.

Career Highlights

Guan is currently employed at Advanced Technology Materials, Inc., where he continues to innovate in the semiconductor industry. His expertise in chemical formulations has positioned him as a key player in enhancing manufacturing processes.

Collaborations

Some of his notable coworkers include William A. Wojtczak and Long Van Nguyen, who contribute to the collaborative environment at Advanced Technology Materials, Inc. Their combined efforts foster innovation and drive advancements in semiconductor technology.

Conclusion

George Guan's contributions to semiconductor technology through his patents demonstrate his commitment to innovation in the field. His work not only enhances manufacturing processes but also sets a foundation for future advancements in semiconductor applications.

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