The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2001
Filed:
Aug. 20, 1999
Applicant:
Inventors:
William A. Wojtczak, San Jose, CA (US);
George Guan, San Jose, CA (US);
Stephen A. Fine, Peabody, MA (US);
Assignee:
Advanced Technology Materials, Inc., Danbury, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 9/04 ; B08B 6/00 ; C03C 2/300 ;
U.S. Cl.
CPC ...
C11D 9/04 ; B08B 6/00 ; C03C 2/300 ;
Abstract
A semiconductor wafer cleaning formulation for use in post plasma ashing semiconductor fabrication comprising the following components in the percentage by weight ranges shown: an organic amine 2-98%; water 0-50%; a 1,3-dicarbonyl compound chelating agent 0.1-60%; a second or alternative chelating agent 0-25%; a polar organic solvent 2-98%.
Wojtczak, William. (2001). Formulations including a 1, 3-dicarbonyl compound chelating agent for stripping residues from semiconductor substrates (U.S. Patent No. 6211126). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6211126
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile