Company Filing History:
Years Active: 2006
Title: George E. Lamborn, III: Innovator in Chemical Mechanical Polishing Pads
Introduction
George E. Lamborn, III is a notable inventor based in Wilmington, DE (US). He has made significant contributions to the field of chemical mechanical polishing, particularly with his innovative methods for creating polishing pads. His work has implications for various industries, including electronics and materials science.
Latest Patents
Lamborn holds a patent for a "Method of forming a polishing pad with reduced stress window." This invention provides a chemical mechanical polishing pad that features reduced stress windows. The method involves primary annealing a window separate from the polishing pad material and positioning the polishing pad material around the periphery of the primary annealed window before reaching a predetermined quench temperature. Additionally, the method includes secondary annealing the window and polishing pad material together, followed by cutting them to a predetermined thickness.
Career Highlights
George E. Lamborn, III is associated with Rohm and Haas Electronic Materials CMP Holdings, Inc., where he has been instrumental in advancing polishing pad technology. His expertise in this area has led to innovations that enhance the performance and reliability of polishing processes in various applications.
Collaborations
Lamborn has collaborated with notable colleagues, including Kyle W. David and Robert T. Gamble. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the field of chemical mechanical polishing.
Conclusion
George E. Lamborn, III is a distinguished inventor whose work in chemical mechanical polishing pads has made a significant impact on the industry. His innovative methods and collaborations continue to drive advancements in this essential technology.