Wilmington, DE, United States of America

George E Lamborn, Iii


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: George E. Lamborn, III: Innovator in Chemical Mechanical Polishing Pads

Introduction

George E. Lamborn, III is a notable inventor based in Wilmington, DE (US). He has made significant contributions to the field of chemical mechanical polishing, particularly with his innovative methods for creating polishing pads. His work has implications for various industries, including electronics and materials science.

Latest Patents

Lamborn holds a patent for a "Method of forming a polishing pad with reduced stress window." This invention provides a chemical mechanical polishing pad that features reduced stress windows. The method involves primary annealing a window separate from the polishing pad material and positioning the polishing pad material around the periphery of the primary annealed window before reaching a predetermined quench temperature. Additionally, the method includes secondary annealing the window and polishing pad material together, followed by cutting them to a predetermined thickness.

Career Highlights

George E. Lamborn, III is associated with Rohm and Haas Electronic Materials CMP Holdings, Inc., where he has been instrumental in advancing polishing pad technology. His expertise in this area has led to innovations that enhance the performance and reliability of polishing processes in various applications.

Collaborations

Lamborn has collaborated with notable colleagues, including Kyle W. David and Robert T. Gamble. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the field of chemical mechanical polishing.

Conclusion

George E. Lamborn, III is a distinguished inventor whose work in chemical mechanical polishing pads has made a significant impact on the industry. His innovative methods and collaborations continue to drive advancements in this essential technology.

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