The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Jun. 10, 2004
Kyle W. David, Newark, DE (US);
Robert T. Gamble, Boothwyn, PA (US);
Leslie A. Haschak, Wilmington, DE (US);
George E. Lamborn, Iii, Wilmington, DE (US);
Jason M. Lawhorn, Newark, DE (US);
John V. H. Roberts, Newark, DE (US);
Kyle W. David, Newark, DE (US);
Robert T. Gamble, Boothwyn, PA (US);
Leslie A. Haschak, Wilmington, DE (US);
George E. Lamborn, III, Wilmington, DE (US);
Jason M. Lawhorn, Newark, DE (US);
John V. H. Roberts, Newark, DE (US);
Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington, DE (US);
Abstract
The present invention provides a chemical mechanical polishing pad having reduced stress windows. In addition, the present invention provides a method of forming a chemical mechanical polishing pad, the method comprising, primary annealing a window separate from a polishing pad material and providing the polishing pad material in a periphery of the primary annealed window before a predetermined quench temperature of the primary annealed window. The method further comprises secondary annealing the window and the polishing pad material together and cutting the secondary annealed window and the polishing pad material to a predetermined thickness.