Hirschaid, Germany

Georg R Kestler

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Rohm & Haas Electronic Materials LLC. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Georg R Kestler. Retrieved from https://idiyas.com/inventor/georg-r-kestler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Georg R. Kestler: Innovator in Curable Compositions

Introduction

Georg R. Kestler is a distinguished inventor based in Hirschaid, Germany. He has made notable contributions to the field of materials science, particularly with innovations related to curable compositions. His work has implications in various optical media applications.

Latest Patents

Kestler holds a patent for "Curable compositions," which encompasses details about these compositions and their role in creating optical media. These curable compositions, once cured, can lead to advanced materials that are pivotal in the development of optical technologies.

Career Highlights

Georg R. Kestler is affiliated with Rohm & Haas Electronic Materials LLC, a company renowned for its commitment to innovation in electronic materials. Throughout his career, Kestler has focused on research that pushes the boundaries of material applications in electronics, showcasing his dedication to enhancing technological solutions.

Collaborations

Kestler has worked closely with colleagues, including Lujia Bu and Edward Greer. Their combined expertise has contributed significantly to the advancements in curable compositions and their applications in optical media, fostering a collaborative environment that drives innovation.

Conclusion

Georg R. Kestler's work exemplifies the spirit of innovation in the field of materials science. With his patent and collaborative efforts at Rohm & Haas Electronic Materials LLC, he continues to influence the development of new technologies that meet the demands of the evolving market. Kestler's contributions serve as an inspiration for future inventors aiming to make a significant impact through their innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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