Gyeonggi-do, South Korea

Geon Jong Kim

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.3

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Geon Jong Kim: Innovator in Substrate Processing Technology

Introduction

Geon Jong Kim is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing, holding three patents that showcase his innovative approach to technology. His work focuses on improving the efficiency and effectiveness of substrate treatment processes.

Latest Patents

Geon Jong Kim's latest patents include a substrate processing apparatus and a substrate processing method. The first patent provides an apparatus designed for treating a substrate, which includes a chuck that supports the substrate, a gas supply unit for delivering process gas to the substrate's edge region, and an edge electrode that surrounds the substrate. This edge electrode is uniquely designed to generate plasma from the gas, featuring a ring shape with a groove that extends from its inner to outer circumference. The second patent also pertains to a substrate processing apparatus, which allows for a greater supply flow rate of process gas to the central area of the substrate compared to the edge area during processing. This innovation enhances the treatment of the substrate, ensuring more effective results.

Career Highlights

Geon Jong Kim is currently employed at Psk Inc., where he continues to develop and refine his innovative technologies. His work at the company has positioned him as a key player in the substrate processing industry, contributing to advancements that benefit various applications.

Collaborations

Geon Jong Kim collaborates with talented individuals such as Jong Chan Lee and Kwang Sung Yoo. These partnerships foster a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Geon Jong Kim is a distinguished inventor whose work in substrate processing technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to enhancing substrate treatment processes.

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