The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
May. 28, 2020
Applicant:
Psk Inc., Gyeonggi-do, KR;
Inventors:
Jong Chan Lee, Gyeonggi-do, KR;
Geon Jong Kim, Gyeonggi-do, KR;
Kwang Sung Yoo, Gyeonggi-do, KR;
Seok June Yun, Gyeonggi-do, KR;
Assignee:
PSK INC., Gyeonggi-Do, KR;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/687 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32385 (2013.01); H01J 37/32449 (2013.01); H01J 37/32541 (2013.01); H01L 21/687 (2013.01); H05H 1/46 (2013.01);
Abstract
A substrate processing apparatus are provided. The substrate processing apparatus allows a supply flow rate per unit time for process gas supplied to the central area of a substrate to be greater than a supply flow rate per unit time for process gas supplied to an edge area of the substrate, when processing the edge area of the substrate supported by the chuck.