Genichi Katagiri

Title: Genichi Katagiri: Innovator in Plasma Technology

Introduction

Genichi Katagiri is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of plasma deposition processes.

Latest Patents

One of his latest patents is a plasma deposition method and an apparatus therefor. This innovation involves feeding a plasma generating gas and a reactive gas into a vacuum container. A magnetic field and microwaves are applied to generate plasma through Electron Cyclotron Resonance (ECR). This process allows for the formation of SiO₂ or SiOF films on aluminum wiring. In the initial phase of film deposition, the radio-frequency power for plasma lead-in is adjusted to zero. After depositing the film to a thickness of tens of nanometers, the power is increased to a normal level, generating an intensive anisotropic plasma. This method effectively prevents damage to the gate oxide film by lowering the voltage applied to it due to the insulating film formed on the wafer surface.

Another notable patent is for an electrostatic chuck designed to establish a uniform temperature distribution on a wafer surface. The chuck's surface is processed to have projections and recesses, allowing it to hold the wafer through electrostatic attractive force. The uneven surface configuration is designed to change the rate of heat transmission, ensuring that the central portion of the wafer receives more heat than the peripheral portion. The height of the projections is limited to a range of 10 to 70 micrometers, enabling effective control of the temperature distribution on the wafer.

Career Highlights

Genichi Katagiri has worked with notable companies in the technology sector, including Tokyo Electron Limited and Fuji Electric Co., Ltd. His experience in these organizations has contributed to his expertise in plasma technology and innovation.

Collaborations

Throughout his career, Katagiri has collaborated with esteemed colleagues such as Makoto Toraguchi and Yasushi Sakakibara. These partnerships have fostered advancements in the field and have led to the development of groundbreaking technologies.

Conclusion

Genichi Katagiri's contributions to plasma technology through his innovative patents and collaborations highlight his significant role in advancing this field. His work continues to influence the industry and pave the way for future innovations.