Yamaguchi, Japan

Gen Ishida

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Toyo Kohan Co., Ltd.. Active years: 2012-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gen Ishida. Retrieved from https://idiyas.com/inventor/gen-ishida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012-2016

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2 patents (USPTO):Explore Patents

Title: Gen Ishida: Innovator in Hard Disk Substrate Technology

Introduction

Gen Ishida is a notable inventor based in Yamaguchi, Japan. He has made significant contributions to the field of hard disk substrate technology, holding a total of 2 patents. His work focuses on improving the quality and durability of hard disk substrates through innovative methods.

Latest Patents

One of Gen Ishida's latest patents is a method for producing a hard disk substrate. The objective of this invention is to create a hard disk substrate that features a smooth surface of a plating film through electroless NiP plating. This method ensures that the substrate maintains its corrosion resistance against acid solutions. The process involves immersing a substrate in a first electroless NiP plating bath containing an additive with leveling action, forming a lower layer of the plating film with reduced surface roughness. Subsequently, the substrate is immersed in a second electroless NiP plating bath to form an upper layer that offers enhanced corrosion resistance and a thickness of at least 4 µm.

Another significant patent by Ishida is related to the surface-finishing of glass substrates for magnetic disks. In this method, the inner peripheral edge of a toroidal glass substrate undergoes mechanical polishing to achieve a surface roughness of no greater than 9 nm in terms of Rmax. Following this, chemical polishing is applied to remove at least 2 µm of the surface layer, resulting in a non-conventional mirror-finished surface. This innovative approach ensures sufficient ring strength even with a polishing depth of less than 5 µm.

Career Highlights

Gen Ishida is currently employed at Toyo Kohan Co., Ltd., where he continues to develop and refine technologies related to hard disk substrates. His expertise in this area has positioned him as a key figure in the advancement of magnetic disk technology.

Collaborations

Throughout his career, Gen Ishida has collaborated with esteemed colleagues such as Yoshio Uchiyama and Hiroshi Doi. These partnerships have contributed to the successful development of his innovative patents.

Conclusion

Gen Ishida's contributions to hard disk substrate technology demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of materials and processes that enhance the performance and durability of magnetic disks.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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