The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2012

Filed:

Mar. 24, 2008
Applicants:

Yoshio Uchiyama, Tokyo, JP;

Hiroshi Doi, Yamaguchi, JP;

Gen Ishida, Yamaguchi, JP;

Inventors:

Yoshio Uchiyama, Tokyo, JP;

Hiroshi Doi, Yamaguchi, JP;

Gen Ishida, Yamaguchi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/84 (2006.01); B24B 1/00 (2006.01); C03C 15/02 (2006.01); G11B 5/71 (2006.01);
U.S. Cl.
CPC ...
Abstract

An inner peripheral edge of a toroidal glass substrate for a magnetic disk is subjected to mechanical polishing in such a manner that the surface roughness is no greater than 9 nm in terms of Rmax. Then, the inner peripheral edge is subjected to chemical polishing to remove at least 2 μm of a surface layer. The inner peripheral edge has a non-conventional mirror-finished surface obtained by mechanical polishing. Thus, sufficient ring strength is obtained even when the chemical polishing depth is smaller than in the past. A polishing depth of less than 5 μm is sufficient.


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