Gavin Lewis Williams

Title: Gavin Lewis Williams: Innovator in Holographic Technology

Introduction

Gavin Lewis Williams is a notable inventor based in Sheffield, GB. He has made significant contributions to the field of holographic technology, holding 2 patents that showcase his innovative approach to light manipulation and pattern generation.

Latest Patents

Williams' latest patents include an exposure apparatus and methods that utilize a light beam collimated by illumination optics. This technology illuminates the surface of a wave front modulator, such as a Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels through projection optics to the substrate, passing through a projection lens assembly. The SLM is programmed or CGH configured with a modulation pattern based on the substrate's topography and desired pattern. His second patent involves a method of generating holographic diffraction patterns, which allows for the creation of holographic masks without the need for a physical object to record. This method defines geometrical shapes in a three-dimensional coordinate space, generating holographic patterns at a defined distance.

Career Highlights

Gavin has worked at prestigious institutions such as the University of Durham and the University of Sheffield. His work has significantly advanced the understanding and application of holographic technology in various fields.

Collaborations

Throughout his career, Williams has collaborated with notable colleagues, including Alan Purvis and Richard Peter McWilliam. These collaborations have further enriched his research and development efforts.

Conclusion

Gavin Lewis Williams is a pioneering inventor whose work in holographic technology continues to influence the field. His innovative patents and collaborations reflect his commitment to advancing technology and enhancing our understanding of light manipulation.