The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Jul. 30, 2009
Peter Anthony Ivey, Hope Valley, GB;
Richard Peter Mcwilliam, Durham, GB;
Alan Purvis, Durham, GB;
Gavin Lewis Williams, Sheffield, GB;
Nicholas Luke Seed, Sheffield, GB;
Richard Ian Curry, Durham, GB;
Jose Juan DE Jesus Toriz-garcia, Sheffield, GB;
Peter Anthony Ivey, Hope Valley, GB;
Richard Peter McWilliam, Durham, GB;
Alan Purvis, Durham, GB;
Gavin Lewis Williams, Sheffield, GB;
Nicholas Luke Seed, Sheffield, GB;
Richard Ian Curry, Durham, GB;
Jose Juan De Jesus Toriz-Garcia, Sheffield, GB;
University of Durham, Durham, GB;
University of Sheffield, Sheffield, GB;
Abstract
A light beam collimated by illumination optics () from a radiation source () illuminates the surface of a wave front modulator () such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics () to the substrate (), passing through a projection lens assembly (). The SLM () is programmed or CGH configured with a modulation pattern that is determined by the substrate () topography and desired pattern. The substrate topography is provided by Digital Holography (DH) surface profilometery performed by a DH microscope (), which provides geometrical or topographical input to the CGH calculation routines (). An arrangement for vertical or sloping surface patterning has a grating () superimposed onto the CGH pattern () to generate +1 and −1 orders. The SLM or CGH may be configured: using Fresnel patterns to provide an extended depth of field of the projected wave front; by encoding line segments of the desired pattern as cylindrical lines; by calculating inverse propagation between non-planar topography of the substrate and the SLM or CGH (using a Rayleigh-Sommerfield diffraction formula); and/or using iteration to determine a restricted encoding in the configuration of the SLM or CGH.