Location History:
- Bethlehem, PA (US) (1981 - 1982)
- Pelham, AL (US) (1986)
Company Filing History:
Years Active: 1981-1986
Title: The Innovative Contributions of Gary M Gray
Introduction
Gary M Gray is a notable inventor based in Bethlehem, PA, who has made significant contributions to the field of lithographic resist compositions. With a total of four patents to his name, Gray's work has advanced the technology used in photoresists, which are crucial for the semiconductor manufacturing process.
Latest Patents
Among his latest patents, Gray has developed a deep ultra-violet lithographic resist composition and process of using positive deep ultra-violet photoresists. These photoresists are base developable and comprise base soluble polymers. They utilize photosensitive solubilizing agents that include oligomeric compounds with specific molecular weight ranges. His innovative approach has enhanced the efficiency and effectiveness of photoresists in various applications.
Career Highlights
Throughout his career, Gary M Gray has worked with reputable companies, including J.T. Baker Chemical Company. His experience in the chemical industry has provided him with a solid foundation for his inventive work. Gray's contributions have not only advanced technology but have also paved the way for future innovations in the field.
Collaborations
Gray has collaborated with notable individuals such as George Schwartzkopf and has been associated with J.T. Baker Chemical Company. These collaborations have enriched his work and expanded the impact of his inventions.
Conclusion
Gary M Gray's innovative contributions to the field of lithographic resist compositions demonstrate his expertise and commitment to advancing technology. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing processes.