J. T. Baker Chemical Company

Other

Gary M Gray

George Schwartzkopf

J T Baker Chemical Co

Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents oligomeric compounds of the formula ##STR1## wherein X is alkylene, arylene, alkoxyalkylene or aralkylene and n is a positive integer such that the molecular weight of the oligomeric compound is from about 500 to about 3000.

Deep ultra-violet lithographic resist composition and process of using

Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents compounds of the formula ##STR1## wherein R.sup.1 and R.sup.2 can each individually be alkyl, aryl, alkoxy alkyl, aralkyl or haloalkyl radicals or R.sup.1 and R.sup.2 taken together can be an alkylene radical.

4-Phenoxy-2-butene derivatives are disclosed as inhibitors of cytokinin plant growth regulatory activity and as possessing seed germination regulatory properties and senescence delaying activity when applied to plants. 4-Phenoxy-2-butene derivatives can also be useful as plant dwarfing agents, agents to retard seedling development or as herbicides.

4-Phenoxy-2-butene derivatives as plant growth regulators

A method for the preparation of (E)-4-bromo-2-methylbut-2-en-1-al comprises brominating 3,4-epoxy-3-methyl-1-butene with cupric bromide in the presence of lithium carbonate.

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Bethlehem, PA, United States of America

Gary M Gray