Gary John Suzuki

Title: Gary John Suzuki: Innovator in Surface Patterning Technologies

Introduction

Gary John Suzuki is a notable inventor based in San Jose, California. He has made significant contributions to the field of surface patterning technologies, holding a total of 3 patents. His work focuses on innovative methods that enhance electronic component fabrication processes.

Latest Patents

One of his latest patents is titled "Patterning a surface comprising silicon and carbon." This patent describes a method for patterning a surface that includes features with silicon and carbon coupled to a substrate. The process involves coating the surface with 3-(trimethoxysilyl)propyl methacrylate, applying a photoresist, imaging the photoresist, etching the surface, and finally removing the photoresist. Another significant patent is "Method for repairing photoresist layer defects using index matching overcoat." This method addresses the repair of damaged photomasks used in electronic component fabrication, particularly for disk drive sliders. It includes applying an overcoat material that closely matches the index of refraction of the photoresist material to create a non-scattering boundary surface.

Career Highlights

Gary John Suzuki is currently employed at Hitachi Global Storage Technologies Netherlands B.V. His work at this company has allowed him to develop and refine his innovative techniques in surface patterning.

Collaborations

Throughout his career, Gary has collaborated with notable colleagues, including Dennis R McKean and Cherngye Hwang. These collaborations have contributed to the advancement of technologies in the field.

Conclusion

Gary John Suzuki is a prominent inventor whose work in surface patterning technologies has led to significant advancements in electronic component fabrication. His innovative patents and collaborations highlight his contributions to the industry.