Company Filing History:
Years Active: 2013-2024
Title: Gary Doyle: Innovator in Polymer Chemistry
Introduction
Gary Doyle is a notable inventor based in Round Rock, Texas. He has made significant contributions to the field of polymer chemistry, holding a total of 3 patents. His work focuses on curable compositions and nanoimprint lithography, showcasing his expertise in innovative material applications.
Latest Patents
One of Gary Doyle's latest patents is a curable composition that includes a polymerizable material with a specific monomer formula. This composition is designed to form a cured layer that exhibits excellent etch resistance. Another significant patent involves a nanoimprint lithography method that utilizes a composite polymerizable coating. This method enhances etch uniformity and substrate pretreatment, resulting in a precise polymeric layer with controlled protrusions.
Career Highlights
Throughout his career, Gary has worked with prominent companies such as Canon Kabushiki Kaisha and Molecular Imprints, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in polymer technology.
Collaborations
Gary has collaborated with talented individuals in his field, including Weijun Liu and Fen Wan. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Gary Doyle's contributions to polymer chemistry and nanoimprint lithography highlight his role as an influential inventor. His patents reflect a commitment to advancing technology and improving material performance.