The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Jan. 18, 2012
Applicants:
Gary F. Doyle, Round Rock, TX (US);
Gerard M. Schmid, Rensselaer, NY (US);
Michael N. Miller, Austin, TX (US);
Douglas J. Resnick, Leander, TX (US);
Dwayne L. Labrake, Cedar Park, TX (US);
Inventors:
Gary F. Doyle, Round Rock, TX (US);
Gerard M. Schmid, Rensselaer, NY (US);
Michael N. Miller, Austin, TX (US);
Douglas J. Resnick, Leander, TX (US);
Dwayne L. LaBrake, Cedar Park, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for forming an imprint lithography template are provided. Materials for forming the imprint lithography template may be etched at different rates based on physical properties of the layers. Additionally, reflectance of the materials may be monitored to provide substantially uniform erosion of the materials.