Company Filing History:
Years Active: 2006
Title: Unveiling Inventor Gart-Jan Heerens from Schoonhoven, NL
Introduction:
Meet Gart-Jan Heerens, a talented inventor hailing from Schoonhoven, NL, whose innovative spirit has led to the creation of groundbreaking technologies in the field of lithographic projection apparatus.
Latest Patents:
Gart-Jan Heerens holds a significant patent titled "Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby." This patent revolutionizes mask technology by introducing three brackets with grooves designed to interact with specific pins on a mask gripper, ensuring precise mechanical positioning.
Career Highlights:
Heerens is a key contributor at ASML Netherlands B.V., a renowned company in the innovation landscape. His expertise and dedication have played a crucial role in the development of cutting-edge technologies for the semiconductor industry.
Collaborations:
Throughout his career, Gart-Jan Heerens has collaborated with esteemed professionals in the field. Among his notable coworkers are Erik Leonardus Ham and Bastiaan Lambertus Wilhemus Marinus Van De Ven, who have collectively worked towards advancing technological solutions in the industry.
Conclusion:
In conclusion, Gart-Jan Heerens stands as a beacon of innovation in the realm of lithographic projection apparatus. His patented inventions and collaborative efforts underscore his commitment to driving technological advancement, making him a prominent figure in the world of inventions and patents.